positioning a patterned mesa portion of a template above a first shot area of a substrate, the substrate having a transfer target material in the first shot area and a second shot area of the substrate, the first and second shot areas being in different regions of the substrate that do not overlap;

pressing the patterned mesa portion into the transfer target material in the first shot area;

setting exposure conditions for the transfer target material in the first shot area;

exposing the first shot area with an exposure light source using an exposure intensity profile and exposure timing based on the set exposure conditions for the first shot area to cure the transfer target material in the first shot area;

separating the template from the first shot area of the substrate while leaving a first patterned region in the first shot area;

after separating the template, positioning the patterned mesa portion of the template above the second shot area;

after positioning the patterned mesa portion of the template above the second shot area, pressing the patterned mesa portion into the transfer target material in the second shot area;

setting exposure conditions for the transfer target material in the second shot material;

after pressing the patterned mesa portion into the transfer target material in the second shot area, exposing the second shot area with the exposure light source using an exposure intensity profile and exposure timing based on the set exposure conditions for the second shot area to cure the transfer target material in the second shot areas; and

separating the template from the second shot area of the substrate while leaving a second patterned region in the second shot area, wherein

the exposure conditions for the transfer target material in a central portion of the first shot area are different from the exposure conditions for the transfer target material in a central portion of the second shot area, the central portions of the first shot area and the second shot area being non-overlapping, and

the first and second shot areas each individually have a planar area at least equal to a planar area of the patterned mesa portion of the template.