US 12,078,923 B2
Pellicle, exposure original plate, exposure apparatus, method of manufacturing pellicle, and method of manufacturing semiconductor device
Yousuke Ono, Sodegaura (JP)
Assigned to MITSUI CHEMICALS, INC., Tokyo (JP)
Appl. No. 18/002,692
Filed by MITSUI CHEMICALS, INC., Tokyo (JP)
PCT Filed Aug. 3, 2021, PCT No. PCT/JP2021/028798
§ 371(c)(1), (2) Date Dec. 21, 2022,
PCT Pub. No. WO2022/030498, PCT Pub. Date Feb. 10, 2022.
Claims priority of application No. 2020-133262 (JP), filed on Aug. 5, 2020.
Prior Publication US 2023/0341763 A1, Oct. 26, 2023
Int. Cl. G03F 1/64 (2012.01); G03F 7/00 (2006.01)
CPC G03F 1/64 (2013.01) [G03F 7/70033 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A pellicle comprising:
a pellicle membrane including at least one selected from the group consisting of a carbon-based membrane having a carbon content of 40% by mass or more, polysilicon, and silicon carbide; and
a support frame that supports the pellicle membrane,
wherein the pellicle membrane and the support frame are in contact with each other, and the following condition A is satisfied:
condition A: the support frame has a width of unevenness of 10 μm or less at an edge portion at a surface side in contact with the pellicle membrane and at an inner side of the pellicle.