US 12,078,178 B2
Vacuum pump and control device
Shinichi Yoshino, Yachiyo (JP); Masayuki Takeda, Yachiyo (JP); and Naoki Miyasaka, Yachiyo (JP)
Assigned to Edwards Japan Limited, Yachiyo (JP)
Appl. No. 18/256,020
Filed by Edwards Japan Limited, Yachiyo (JP)
PCT Filed Dec. 21, 2021, PCT No. PCT/JP2021/047364
§ 371(c)(1), (2) Date Jun. 5, 2023,
PCT Pub. No. WO2022/145292, PCT Pub. Date Jul. 7, 2022.
Claims priority of application No. 2020-219429 (JP), filed on Dec. 28, 2020.
Prior Publication US 2024/0060496 A1, Feb. 22, 2024
Int. Cl. F04D 19/04 (2006.01); F04D 27/00 (2006.01); F04D 29/58 (2006.01); F04D 29/70 (2006.01)
CPC F04D 19/042 (2013.01) [F04D 27/006 (2013.01); F04D 29/582 (2013.01); F04D 29/701 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A vacuum pump comprising:
a vacuum pump main body which exhausts a gas in a chamber; and
a control device which controls the vacuum pump main body, wherein:
the control device executes:
a first temperature control for heating a pipe connected to a stage subsequent to the vacuum pump main body by a heater attached on the pipe, and
a second temperature control for cooling a trap device with a refrigerant, the trap device connected to the pipe, wherein the trap device is configured to generate a deposit from the gas exhausted from the chamber to remove the deposit.