US 12,077,880 B2
In-situ film growth rate monitoring apparatus, systems, and methods for substrate processing
Zhepeng Cong, San Jose, CA (US); Nyi Oo Myo, San Jose, CA (US); Tao Sheng, Santa Clara, CA (US); and Yong Zheng, Dublin, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Apr. 28, 2021, as Appl. No. 17/243,158.
Prior Publication US 2022/0349088 A1, Nov. 3, 2022
Int. Cl. C30B 25/16 (2006.01); C23C 14/50 (2006.01); C23C 14/54 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23C 16/52 (2006.01); C30B 23/00 (2006.01); C30B 23/06 (2006.01); C30B 25/10 (2006.01); C30B 25/12 (2006.01); G01N 21/55 (2014.01); B41J 2/16 (2006.01); G01B 11/06 (2006.01); H01L 21/02 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01)
CPC C30B 25/16 (2013.01) [C23C 14/50 (2013.01); C23C 14/541 (2013.01); C23C 14/547 (2013.01); C23C 16/4583 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); C30B 23/002 (2013.01); C30B 23/063 (2013.01); C30B 25/10 (2013.01); C30B 25/12 (2013.01); G01N 21/55 (2013.01); B01J 2219/00443 (2013.01); B41J 2/1642 (2013.01); G01B 11/0625 (2013.01); G01N 2201/062 (2013.01); H01L 21/02266 (2013.01); H01L 21/02271 (2013.01); H01L 21/67253 (2013.01); H01L 22/12 (2013.01); H01L 22/26 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A reflectometer system to monitor film growth during substrate processing operations, comprising:
a first block comprising a first inner surface;
a light emitter disposed in the first block and oriented toward the first inner surface;
a light receiver disposed in the first block and oriented toward the first inner surface;
a second block opposing the first block, the second block comprising:
a second inner surface facing the first inner surface; and
a first connector bar coupled to the first block and the second block, and a second connector bar coupled to the first block and the second block, the first connector bar and the second connector bar separating the first block and the second block.