CPC C25B 11/075 (2021.01) [C01B 21/0615 (2013.01); C01B 21/0622 (2013.01); C25B 1/04 (2013.01); C25B 9/73 (2021.01); C25B 11/051 (2021.01); C25B 11/057 (2021.01); C30B 25/06 (2013.01); C30B 29/38 (2013.01); C01P 2002/02 (2013.01); C01P 2002/76 (2013.01)] | 8 Claims |
1. A method for manufacturing nitride catalyst, comprising:
putting a Ru target and an M target into a nitrogen-containing atmosphere, wherein M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn;
providing powers to the Ru target and the M target, respectively; and
providing ions to bombard the Ru target and the M target, to sputtering deposit MxRuyN2 on a substrate, wherein 0<x<1.3, 0.7<y<2, and x+y=2,
wherein MxRuyN2 is a cubic crystal system or amorphous.
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