US 12,077,865 B2
Film forming method and film forming apparatus
Hideki Yuasa, Nirasaki (JP); Hiroyuki Ikuta, Nirasaki (JP); Yutaka Fujino, Nirasaki (JP); Makoto Wada, Nirasaki (JP); and Hirokazu Ueda, Osaka (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Aug. 19, 2022, as Appl. No. 17/820,929.
Claims priority of application No. 2021-139582 (JP), filed on Aug. 30, 2021.
Prior Publication US 2023/0061151 A1, Mar. 2, 2023
Int. Cl. C23C 16/00 (2006.01); C23C 16/34 (2006.01); C23C 16/56 (2006.01); H01J 37/32 (2006.01)
CPC C23C 16/56 (2013.01) [C23C 16/345 (2013.01); H01J 37/32192 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A film forming method of forming a film on a substrate by using a film forming apparatus including a processing container, and a stage provided in an interior of the processing container to place the substrate thereon and in which aluminum is contained, the film forming method comprising:
forming a film continuously on one substrate or on a plurality of substrates by supplying a gas for film formation to the interior of the processing container while heating the substrate placed on the stage;
cleaning the interior of the processing container with a fluorine-containing gas in a state in which the substrate is unloaded from the processing container; and
performing a post-process by generating plasma of an oxygen- and hydrogen-containing gas in the interior of the processing container,
wherein the forming the film, the cleaning the interior of the processing container, and the performing the post-process are repeatedly performed,
wherein, in the cleaning the interior of the processing container, the fluorine-containing gas and the aluminum contained in the stage react with each other to generate an aluminum fluoride, and in the performing the post-process, at least one of Al(OH)3 or Al2O3 is generated as a reaction product by a reaction between the aluminum fluoride and the plasma of the oxygen- and hydrogen-containing gas, and
wherein the oxygen- and hydrogen-containing gas includes a mixed gas of a N2O gas and a H2 gas.