US 12,077,848 B2
Vacuum processing apparatus
Kanto Nakamura, Nirasaki (JP); Hiroyuki Yokohara, Nirasaki (JP); and Yuki Motomura, Nirasaki (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Apr. 13, 2022, as Appl. No. 17/659,018.
Claims priority of application No. 2021-072077 (JP), filed on Apr. 21, 2021.
Prior Publication US 2022/0341028 A1, Oct. 27, 2022
Int. Cl. H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01)
CPC C23C 14/3464 (2013.01) [C23C 16/4412 (2013.01); H01J 37/32449 (2013.01); H01J 37/32651 (2013.01); H01J 37/3447 (2013.01)] 4 Claims
OG exemplary drawing
 
1. A vacuum processing apparatus comprising:
a stage on which a substrate is placed; and
a shutter configured to be able to move between a shielding position at which the stage is covered and a retracted position that is retracted from the shielding position,
wherein the shutter arranged at the shielding position forms a processing space between the shutter and the stage,
wherein the shutter includes:
a support member;
a support pillar provided at an end of the support member;
a gas supplier provided in the support member and configured to supply a gas into the processing space; and
a gas exhauster provided closer to a center side of the processing space than the gas supplier and configured to exhaust the gas from the processing space,
wherein the gas supplier includes:
a first gas supplier configured to supply a first gas into the processing space from an outer peripheral portion of the shutter, the first gas supplier being formed in an annular shape in a plan view; and
a second gas supplier configured to supply a second gas into the processing space from a central portion of the shutter, the second gas supplier being formed in an annular shape in the plan view,
wherein the gas exhauster is arranged in an annular shape between the first gas supplier and the second gas supplier in the plan view, and
wherein the gas exhauster is formed so as to penetrate the gas supplier in a thickness direction of the gas supplier.