CPC C23C 14/24 (2013.01) [C23C 14/04 (2013.01); C23C 14/50 (2013.01); C23C 14/243 (2013.01)] | 13 Claims |
1. An apparatus for sublimation and deposition of a chemical, the apparatus comprising:
a vacuum chamber where in operation the chamber is below atmospheric pressure;
a template comprising a planar surface containing the chemical to be sublimed, wherein the template is located within the vacuum chamber;
a heating element configured to heat the template and sublimate the chemical on the planar surface of the template;
a substrate retaining device; and
a surface in contact with the substrate retaining device, wherein:
the substrate retaining device is located within the vacuum chamber;
the surface in contact with the substrate retaining device is held at a lower temperature than the template when the template is heated by the heating element;
the substrate retaining device is configured to position a substrate such that compound sublimated from the planar surface of the template can be deposited on the substrate;
the template is a patterned template;
the planar surface comprises a plurality of recessed portions;
the recessed portions are distributed across the planar surface in a pattern;
the recessed portions are configured to contain the chemical;
the arrangement of the recessed portions on the template provides for a deposition pattern of the chemical on the substrate that corresponds to the pattern of the recessed portions on the template;
the vacuum chamber comprises an upper assembly sealed to a lower assembly;
the upper assembly comprises a cooling block with a heat exchange well;
the heat exchange well is external to the vacuum chamber;
the cooling block is formed from a metal;
the heat exchange well contains a coolant; and
the heat exchange well is in contact with the substrate retaining device.
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