| CPC H10N 70/8413 (2023.02) [H10B 63/30 (2023.02); H10N 70/011 (2023.02); H10N 70/063 (2023.02); H10N 70/231 (2023.02); H10N 70/8265 (2023.02); H10N 70/8825 (2023.02); H10N 70/8828 (2023.02); H10N 70/884 (2023.02); G11C 13/0004 (2013.01); H10B 63/84 (2023.02); H10N 70/041 (2023.02); H10N 70/066 (2023.02); H10N 70/826 (2023.02); H10N 70/841 (2023.02); H10N 70/881 (2023.02); H10N 70/8833 (2023.02)] | 20 Claims |

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1. A memory device, comprising:
a first conductive column structure extending through a first dielectric layer;
a first phase change material layer formed over the first dielectric layer;
a second dielectric layer disposed above the first phase change material layer; and
a second conductive column structure extending through the second dielectric layer, wherein the second conductive column structure comprises a shell portion wrapping a core structure filled with a dielectric material and an end portion that is coupled to a first end of the shell portion.
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