| CPC H10F 77/211 (2025.01) [H10F 71/00 (2025.01)] | 19 Claims |

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1. An optoelectronic junction, comprising:
a thin-film doped semiconductor; and
a p-contact layer comprising a two-dimensional (2D) material deposited at an interface of the thin-film doped semiconductor forming the optoelectronic junction, a thickness of the two-dimensional (2D) material being chosen to tailor a Fermi level of the two-dimensional (2D) material to overlap or fall below a valence band edge of the thin-film doped semiconductor at the interface,
wherein the thin-film doped semiconductor comprises a p-type semiconductor,
wherein the p-contact layer comprising the two-dimensional (2D) material comprises a single-layer p-type material or a double-layer p-type material, and
wherein the optoelectronic junction is a p-p+ junction.
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