| CPC H10F 71/1253 (2025.01) [C23C 16/52 (2013.01); H01J 37/32522 (2013.01); H01J 37/32724 (2013.01); H01J 37/3476 (2013.01); H10F 10/162 (2025.01); H10F 71/125 (2025.01); H10F 71/128 (2025.01); H10F 71/138 (2025.01); H10F 71/1257 (2025.01)] | 20 Claims |

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1. A method of calibrating a deposition device to generate a plurality of time and temperature offsets, the method comprising:
setting a substrate holder system of the deposition device to a first set point temperature;
continuously detecting a surface temperature on a calibration surface until a normalization temperature;
recording a time and a surface temperature offset at the normalization temperature;
repeatedly incrementing the first set point temperature to a next set point temperature, detecting a next surface temperature at a next normalization temperature respective to the next set point temperature, and recording a next time and a next surface temperature offset respective to the next set point temperature until the substrate holder system is set to a last set point temperature; and
generate the plurality of time and temperature offsets for the deposition device from each recording at each increment from the first set point temperature to the last set point temperature.
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