| CPC H10F 39/8023 (2025.01) | 20 Claims |

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1. An image sensor, comprising:
a semiconductor substrate having a first surface and a second surface opposite the first surface;
a transmission gate on the first surface of the semiconductor substrate; and
a pixel isolation film in a pixel trench penetrating through the semiconductor substrate, the pixel isolation film defining active pixels in the semiconductor substrate,
wherein the pixel isolation film includes:
an insulating liner on an inner wall of the pixel trench;
a buried layer on the insulating liner and filling a portion of the pixel trench; and
a buried insulating layer disposed in a remaining portion of the pixel trench, and
wherein the buried layer includes a first end being close to the first surface, the first end being spaced apart from the first surface in a first direction perpendicular to the first surface.
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