US 12,406,881 B2
Methods and systems for filling a gap
Elina Färm, Helsinki (FI); Shinya Iwashita, Helsinki (FI); Charles Dezelah, Helsinki (FI); Jan Willem Maes, Wilrijk (BE); Timothee Blanquart, Oud-Heverlee (BE); René Henricus Jozef Vervuurt, Leuven (BE); Viljami Pore, Helsinki (FI); Giuseppe Alessio Verni, Jodoigne (BE); Qi Xie, Wilsele (BE); Ren-Jie Chang, Leuven (BE); and Eric James Shero, Phoenix, AZ (US)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on Feb. 25, 2022, as Appl. No. 17/680,711.
Claims priority of provisional application 63/250,885, filed on Sep. 30, 2021.
Claims priority of provisional application 63/155,382, filed on Mar. 2, 2021.
Claims priority of provisional application 63/155,388, filed on Mar. 2, 2021.
Prior Publication US 2022/0285211 A1, Sep. 8, 2022
Int. Cl. H01L 21/768 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01)
CPC H01L 21/76837 (2013.01) [C23C 16/45553 (2013.01); H01L 21/0228 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A method of filling a gap, the method comprising
providing a substrate to a reaction chamber, the substrate comprising the gap;
exposing the substrate to a precursor and to a reactant, at least one of the precursor and the reactant comprising a metal or a metalloid, and at least one of the precursor and the reactant comprising a halogen;
thereby allowing the precursor and the reactant to form a gap filling fluid; and,
thereby at least partially filling the gap with a gap filling fluid, the gap filling fluid comprising the metal or the metalloid, and
exposing the substrate to a transformation treatment
wherein the transformation treatment comprises exposing the substrate to ultraviolet radiation.