US 12,406,833 B2
Ion extraction optics having non uniform grid assembly
Costel Biloiu, Rockport, MA (US); Alan V. Hayes, San Jose, CA (US); Christopher Campbell, Newburyport, MA (US); and Dmitry Lubomirsky, Cupertino, CA (US)
Assigned to Applied Materials, Inc.
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jun. 12, 2023, as Appl. No. 18/208,762.
Prior Publication US 2024/0412956 A1, Dec. 12, 2024
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32568 (2013.01) [H01J 37/32926 (2013.01)] 12 Claims
OG exemplary drawing
 
1. An ion source, comprising:
a plasma chamber to house a plasma, the plasma being characterized by an ion flux profile at a plasma edge of the plasma, the ion flux profile representing a normalized ion beam intensity as a function of radial position; and
an electrode assembly, the electrode assembly comprising at least two electrodes, the at least two electrodes defined by a grid pattern, the grid pattern comprising a plurality of holes that are disposed in a two-dimensional array,
wherein the plurality of holes exhibit a variation in hole radius that is derived from a mirror function, the mirror function being a complementary function to a fitting function for the ion flux profile.