US 12,406,822 B2
Fastener for securing faceplate to ion source
John Alexander Walder, Beverly, MA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 8, 2023, as Appl. No. 18/144,367.
Prior Publication US 2024/0379319 A1, Nov. 14, 2024
Int. Cl. H01J 37/08 (2006.01); H01J 37/30 (2006.01); H01J 37/317 (2006.01)
CPC H01J 37/08 (2013.01) [H01J 37/3002 (2013.01); H01J 37/3171 (2013.01)] 17 Claims
OG exemplary drawing
 
1. An ion implantation system, comprising:
an ion source comprising:
an arc chamber comprising a plurality of chamber walls and having a first end and a second end; and
a faceplate having an extraction aperture disposed on a top of the plurality of chamber walls;
a source housing having a flange, wherein the arc chamber is disposed on the source housing;
a first strap located near the first end and a second strap located near the second end, each strap having two attachment portions, which pass through respective openings in the flange, and an engagement portion disposed between the two attachment portions, wherein the engagement portion contacts an outer surface of the faceplate; and
a tension system disposed on an opposite side of the flange from the ion source, wherein the tension system applies pressure to press the first strap and the second strap against the faceplate to secure the faceplate to the arc chamber.
 
12. An assembly for use with an ion source, wherein the ion source comprises an arc chamber having a plurality of chamber walls, the assembly comprising:
a faceplate adapted to be disposed on a top of the plurality of chamber walls, the faceplate having two grooves disposed on an outer surface; and
a first strap and a second strap, each having two rounded portions, an engagement portion disposed between the two rounded portions, and two attachment portions, wherein the engagement portion of each strap is configured to be disposed in a respective groove.