US 12,405,542 B2
Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus
István Nagy, Eindhoven (NL); Özer Duman, Eindhoven (NL); Arjan Gijsbertsen, Vught (NL); Pieter Jacob Heres, Veldhoven (NL); Rudolf Michiel Hermans, Eindhoven (NL); Erik Jansen, Eindhoven (NL); Thomas Augustus Mattaar, Veldhoven (NL); Norbertus Josephus Martinus Van Den Nieuwelaar, Tilburg (NL); and Petrus Franciscus Van Gils, Rijen (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/628,959
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Jul. 16, 2020, PCT No. PCT/EP2020/070211
§ 371(c)(1), (2) Date Jan. 21, 2022,
PCT Pub. No. WO2021/018627, PCT Pub. Date Feb. 4, 2021.
Claims priority of application No. 19189017 (EP), filed on Jul. 30, 2019.
Prior Publication US 2022/0260933 A1, Aug. 18, 2022
Int. Cl. G06F 30/398 (2020.01); G03F 9/00 (2006.01)
CPC G03F 9/7046 (2013.01) [G03F 9/7088 (2013.01); G06F 30/398 (2020.01); G03F 9/7096 (2013.01)] 28 Claims
OG exemplary drawing
 
1. A method of determining a mark measurement sequence for an object comprising a plurality of marks, the method comprising:
receiving location data for the plurality of marks that are to be measured;
obtaining a boundary model of a positioning device used for performing the mark measurement sequence;
obtaining thermal state information of the positioning device, the thermal state information representing a thermal state of the positioning device prior to an execution of the mark measurement sequence and/or after an execution of the mark measurement sequence; and
determining the mark measurement sequence based on the location data, the thermal state information and the boundary model.