US 12,405,541 B2
Methods of servicing photolithographic apparatus
Yu-Huan Chen, Hsinchu (TW); Cheng-Hsuan Wu, New Taipei (TW); Ming-Hsun Tsai, Hsinchu (TW); Shang-Chieh Chien, New Taipei (TW); and Li-Jui Chen, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed on Jun. 27, 2024, as Appl. No. 18/756,604.
Application 18/756,604 is a continuation of application No. 17/694,368, filed on Mar. 14, 2022, granted, now 12,055,864.
Application 17/694,368 is a continuation of application No. 17/187,272, filed on Feb. 26, 2021, granted, now 11,275,317, issued on Mar. 15, 2022.
Prior Publication US 2024/0345493 A1, Oct. 17, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01); H05G 2/00 (2006.01)
CPC G03F 7/70858 (2013.01) [H05G 2/002 (2024.08); H05G 2/0023 (2024.08); H05G 2/0092 (2024.08)] 20 Claims
OG exemplary drawing
 
1. A method of servicing a photolithographic apparatus, the method comprising:
determining whether a level of tin in an interior of a droplet generator of the apparatus is below a threshold level;
depressurizing the droplet generator upon determining that the level of tin is below the threshold level;
introducing a gas having a temperature lower than a temperature of the droplet generator into the interior of the droplet generator;
exhausting the gas from the interior of the droplet generator;
determining whether a temperature of the droplet generator is within an acceptable temperature range; and
performing maintenance on the droplet generator upon determining that the temperature is within the acceptable temperature range.