US 12,405,539 B2
Substrate support and substrate table
Coen Hubertus Matheus Baltis, Eindhoven (NL); Nicolaas Ten Kate, Almkerk (NL); Marcus Martinus Petrus Adrianus Vermeulen, Leende (NL); Siegfried Alexander Tromp, Knegsel (NL); Frank Pieter Albert Van Den Berkmortel, Deurne (NL); Niek Jacobus Johannes Roset, Eindhoven (NL); Gijs Kramer, Nijmegen (NL); Nicolaas Petrus Marcus Brantjes, Eindhoven (NL); and Michiel Theodorus Jacobus Fonteyn, Waalre (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/798,354
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Jan. 25, 2021, PCT No. PCT/EP2021/051581
§ 371(c)(1), (2) Date Aug. 9, 2022,
PCT Pub. No. WO2021/170320, PCT Pub. Date Sep. 2, 2021.
Claims priority of application No. 20158919 (EP), filed on Feb. 24, 2020; and application No. 20163571 (EP), filed on Mar. 17, 2020.
Prior Publication US 2023/0075771 A1, Mar. 9, 2023
Int. Cl. G03F 7/00 (2006.01); H01L 21/687 (2006.01)
CPC G03F 7/707 (2013.01) [G03F 7/70341 (2013.01); G03F 7/70808 (2013.01); G03F 7/70875 (2013.01); H01L 21/6875 (2013.01); H01L 21/68785 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate support for supporting a substrate in a lithographic apparatus, the substrate support comprising:
a first support body configured to support the substrate;
a main body separate from the first support body and configured to removably support the first support body, the main body comprising a thermal conditioner configured to thermally condition the main body and/or first support body and/or substrate; and
an extractor body surrounding the main body and the first support body, wherein the extractor body comprises a first extraction channel configured to extract fluid from near a peripheral part of the substrate.