US 12,405,537 B2
Devices, systems, and methods for the transformation and cropping of drop patterns
Tom H. Rafferty, Austin, TX (US); Ahmed M. Hussein, Austin, TX (US); and Byung-Jin Choi, Austin, TX (US)
Assigned to Canon Kabushiki Kaisha, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Jul. 27, 2021, as Appl. No. 17/386,312.
Prior Publication US 2023/0033557 A1, Feb. 2, 2023
Int. Cl. G03F 7/00 (2006.01); G06N 20/00 (2019.01)
CPC G03F 7/70625 (2013.01) [G03F 7/0002 (2013.01); G03F 7/70425 (2013.01); G03F 7/707 (2013.01); G03F 7/70716 (2013.01); G06N 20/00 (2019.01)] 23 Claims
OG exemplary drawing
 
1. A method comprising:
obtaining one or more images of a substrate and of a feature pattern on the substrate;
determining one or more edges of the feature pattern based on the one or more images;
determining an offset of the feature pattern and an angle of the feature pattern based on the one or more images and on the one or more edges of the feature pattern, wherein the offset of the feature pattern indicates a distance between a first point on the feature pattern and a second point on the substrate, and wherein the angle of the feature pattern is relative to a first axis;
generating a transformation for a first drop pattern based on the offset of the feature pattern and on the angle of the feature pattern, wherein the transformation includes a translation or a rotation;
generating a second drop pattern, wherein generating the second drop pattern includes transforming the first drop pattern according to the transformation; and
depositing drops of formable material on the substrate according to the second drop pattern.