US 12,405,533 B2
Resist underlayer film-forming composition containing substituted crosslinkable compound
Keisuke Hashimoto, Toyama (JP); Kenji Takase, Toyama (JP); Tetsuya Shinjo, Toyama (JP); Rikimaru Sakamoto, Toyama (JP); Takafumi Endo, Toyama (JP); and Hirokazu Nishimaki, Toyama (JP)
Assigned to NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo (JP)
Filed by NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo (JP)
Filed on Aug. 6, 2020, as Appl. No. 16/986,921.
Application 16/986,921 is a division of application No. 14/900,384, granted, now 10,809,619, previously published as PCT/JP2014/066680, filed on Jun. 24, 2014.
Claims priority of application No. 2013-134277 (JP), filed on Jun. 26, 2013; and application No. 2013-151934 (JP), filed on Jul. 22, 2013.
Prior Publication US 2020/0379352 A1, Dec. 3, 2020
Int. Cl. G03F 7/11 (2006.01); C07C 39/10 (2006.01); C07C 43/178 (2006.01); C08G 12/08 (2006.01); C09D 161/06 (2006.01); C09D 161/22 (2006.01); G03F 7/09 (2006.01); G03F 7/40 (2006.01); H01L 21/311 (2006.01)
CPC G03F 7/11 (2013.01) [C07C 39/10 (2013.01); C07C 43/1785 (2013.01); C08G 12/08 (2013.01); C09D 161/06 (2013.01); C09D 161/22 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/40 (2013.01); H01L 21/31138 (2013.01); H01L 21/31144 (2013.01)] 2 Claims
OG exemplary drawing
 
1. A resist underlayer film-forming composition comprising:
a resin, wherein the resin is a novolac resin obtained by condensing an aromatic ring-containing compound with an aldehyde compound or a ketone compound, wherein the aromatic ring-containing compound is selected from the group consisting of benzene, naphthalene, phloroglucinol, hydroxynaphthalene, fluorene, carbazole, bisphenol, bisphenol S, diphenylamine, triphenylamine, phenylnaphthylamine, anthracene, hydroxyanthracene, phenothiazine, phenoxazine and phenylindole;
a crosslinkable compound,
wherein the crosslinkable compound is selected from the group consisting of

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry
and
an acid catalyst, wherein the acid catalyst is one or more of p-toluenesulfonic acid, trifluoromethanesulfonic acid, pyridinium p-toluenesulfonate, salicylic acid, 5-sulfosalicylic acid, 4-phenolsulfonic acid, 4-chlorobenzenesulfonic acid, benzenedisulfonic acid, 1-naphthalenesulfonic acid, citric acid, benzoic acid, hydroxybenzoic acid, and naphthalene carboxylic acid.