US 12,405,529 B2
Lithography system and methods
Cheng Hung Tsai, Hsinchu (TW); Sheng-Kang Yu, Hsinchu (TW); Shang-Chieh Chien, Hsinchu (TW); Heng-Hsin Liu, Hsinchu (TW); and Li-Jui Chen, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Aug. 8, 2023, as Appl. No. 18/446,400.
Application 18/446,400 is a division of application No. 17/232,483, filed on Apr. 16, 2021, granted, now 12,287,572.
Prior Publication US 2023/0400763 A1, Dec. 14, 2023
Int. Cl. G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/22 (2006.01); G03F 7/36 (2006.01)
CPC G03F 7/0035 (2013.01) [G03F 7/2004 (2013.01); G03F 7/2026 (2013.01); G03F 7/22 (2013.01); G03F 7/36 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A lithography system, comprising:
projection optics configured to direct patterned radiation onto a region of the wafer;
a mask stage configured to form and direct the patterned radiation to the projection optics;
illumination optics configured to direct unpatterned radiation to the mask stage; and
a light source comprising:
a sectional collector configured to reflect radiation generated by a droplet toward the illumination optics, the sectional collector including:
a central collector section configured to reflect a first portion of the radiation; and
a first peripheral collector section configured to reflect a second portion of the radiation, the first peripheral collector section is vertically separated from the central collector section by a vertical gap, the first peripheral collector section further comprising:
a first surface configured to reflect radiation toward a focal point, the first surface being free of openings;
a second surface opposite the first surface and having substantially the same curvature as the first surface;
a third surface forming an outer edge of the first peripheral collector section and being substantially perpendicular to the first and second surfaces;
a hollow cavity formed within the first peripheral collector section;
a first opening located in the second surface; and
a second opening located opposite the third surface and adjacent to an inner edge of the first peripheral collector section, wherein the first opening, the hollow cavity, and the second opening are in fluid communication to define an airflow path through the first peripheral collector section.