US 12,405,496 B2
Color filter, method for fabricating same, and display panel
Yuxiu Zhang, Guangzhou (CN); and Hailong Wen, Guangzhou (CN)
Assigned to Guangzhou China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Guangzhou (CN)
Appl. No. 17/785,082
Filed by Guangzhou China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Guangzhou (CN)
PCT Filed Jun. 8, 2022, PCT No. PCT/CN2022/097707
§ 371(c)(1), (2) Date Jun. 14, 2022,
PCT Pub. No. WO2023/221201, PCT Pub. Date Nov. 23, 2023.
Claims priority of application No. 202210536117.6 (CN), filed on May 17, 2022.
Prior Publication US 2024/0192542 A1, Jun. 13, 2024
Int. Cl. G02F 1/1335 (2006.01); G03F 7/00 (2006.01)
CPC G02F 1/133516 (2013.01) [G02F 1/133512 (2013.01); G03F 7/0007 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method for fabricating a color filter, comprising:
providing a substrate;
forming a first photoresist material layer on the substrate;
patterning the first photoresist material layer to form a plurality of first photoresists;
forming a second photoresist material layer on the first photoresists and the substrate, wherein the second photoresist material layer comprises a plurality of dye molecules; and
patterning the second photoresist material layer to form a plurality of second photoresists;
wherein the patterning the first photoresist material layer to form forming the first photoresists comprises:
controlling curing process parameters of the first photoresists to increase a density of the first photoresists, thereby preventing the dye molecules from entering the first photoresists,
wherein each of the first photoresists comprises:
a first photoresist portion disposed on a side of the substrate; and
a second photoresist portion disposed on a side of the first photoresist portion away from the substrate;
wherein a density of the second photoresist portion is greater than a density of the first photoresist portion, so as to prevent the dye molecules from entering the first photoresists; or
wherein each of the first photoresists comprises:
a first photoresist portion disposed on a side of the substrate; and
a third photoresist portion covering the substrate and the first photoresist portion;
wherein a density of the third photoresist portion is greater than a density of the first photoresist portion, so as to prevent the dye molecules from entering the first photoresists.