US 12,405,400 B2
Methods and systems for metasurface-based nanofabrication
Juejun Hu, Newton, MA (US); Tian Gu, Fairfax, VA (US); Fan Yang, Cambridge, MA (US); Luigi Ranno, Cambridge, MA (US); and Hung-I Lin, Cambridge, MA (US)
Assigned to Massachusetts Institute of Technology, Cambridge, MA (US)
Filed by Massachusetts Institute of Technology, Cambridge, MA (US)
Filed on Mar. 10, 2022, as Appl. No. 17/691,851.
Claims priority of provisional application 63/186,607, filed on May 10, 2021.
Prior Publication US 2022/0357484 A1, Nov. 10, 2022
Int. Cl. G02B 1/00 (2006.01); G02B 27/00 (2006.01)
CPC G02B 1/002 (2013.01) [G02B 27/0012 (2013.01); G02B 2207/101 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A method of direct laser writing, the method comprising:
focusing or shaping, with a metalens, a first beam to a first intensity pattern within a photoresist, the first intensity pattern polymerizing a first portion of the photoresist; and
supporting the photoresist with a non-planar surface,
wherein focusing the first beam to the first intensity pattern comprises focusing different portions of the first beam to foci distributed with respect to the non-planar surface.