US 12,405,392 B1
Electroplated materials and array design for scintillators
Enkeleda Dervishi-Whetham, Los Alamos, NM (US); Randall Lynn Edwards, Los Alamos, NM (US); Michael Anthony McBride, Los Alamos, NM (US); and Daniel Edwin Hooks, Los Alamos, NM (US)
Assigned to Triad National Security, LLC, Los Alamos, TX (US)
Filed by Triad National Security, LLC, Los Alamos, NM (US)
Filed on Apr. 25, 2023, as Appl. No. 18/139,082.
Claims priority of provisional application 63/337,973, filed on May 3, 2022.
Int. Cl. G01T 1/20 (2006.01); G01T 1/202 (2006.01)
CPC G01T 1/2023 (2013.01) 18 Claims
OG exemplary drawing
 
1. A method of manufacturing a scintillator grid array, the method comprising:
preparing a plurality of substrates each comprising a first material;
depositing a layer of a second material onto each of the plurality of substrates to produce a plurality of electroplated substrates;
pressing the plurality of electroplated substrates into a grid array, wherein pressing the plurality of electroplated substrates into the grid array comprises:
positioning the plurality of electroplated substrates within a hot isostatic pressing can;
welding the hot isostatic pressing can closed; and
hot isostatic pressing the plurality of electroplated substrates;
dissolving the first material from the plurality of electroplated substrates of the grid array; and
placing scintillator crystals into the grid array.