US 12,405,004 B2
Reactor apparatus
Inho Won, Yongin-si (KR); Juhyun Lee, Suwon-si (KR); Jungju Lee, Suwon-si (KR); and Byungchan Lim, Chungju-si (KR)
Assigned to Samsung Electronics Co., Ltd., Gyeonggi-do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Jun. 30, 2022, as Appl. No. 17/854,690.
Claims priority of application No. 10-2021-0087146 (KR), filed on Jul. 2, 2021.
Prior Publication US 2023/0001343 A1, Jan. 5, 2023
Int. Cl. F23G 7/06 (2006.01); B01D 53/02 (2006.01); B01D 53/18 (2006.01); B01J 6/00 (2006.01); F23J 15/04 (2006.01)
CPC F23G 7/065 (2013.01) [B01D 53/025 (2013.01); B01D 53/185 (2013.01); B01J 6/00 (2013.01); F23J 15/04 (2013.01); B01D 2252/103 (2013.01); F23G 2209/14 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A reactor apparatus, comprising:
a reactor chamber having an inlet through which treatment liquid containing by-products is introduced and having an interior space;
a burner at a lower end portion of the reactor chamber configured to burn waste gas;
a guide member above the burner and configured to allow the treatment liquid to flow outwardly of the burner;
a water reservoir between the burner and the guide member, the water reservoir having a double pipe structure having an inner wall portion and an outer wall portion, and through which water supplied through a water inlet is configured to flow between the inner wall portion and the outer wall portion; and
a cover member coupled to an upper end portion of the water reservoir and configured to cover a space between the inner wall portion and the outer wall portion,
wherein an upper end of the outer wall portion is above an upper end of the inner wall portion,
wherein a bottom surface of the cover member includes a plurality of bumps spaced apart from each other in a circumferential direction, the plurality of bumps configured to form a gap of several hundred μm between the bottom surface of the cover member and an upper surface of the inner wall portion of the water reservoir.