US 12,404,603 B2
Gas inlet assembly of process chamber, gas inlet device, and semiconductor processing apparatus
Shikai Li, Beijing (CN)
Assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
Appl. No. 18/262,261
Filed by BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
PCT Filed Dec. 28, 2021, PCT No. PCT/CN2021/141995
§ 371(c)(1), (2) Date Jul. 20, 2023,
PCT Pub. No. WO2022/156495, PCT Pub. Date Jul. 28, 2022.
Claims priority of application No. 202110093628.0 (CN), filed on Jan. 22, 2021.
Prior Publication US 2024/0117522 A1, Apr. 11, 2024
Int. Cl. C23C 16/40 (2006.01); C23C 16/455 (2006.01); C30B 25/14 (2006.01)
CPC C30B 25/14 (2013.01) [C23C 16/45561 (2013.01); C23C 16/45563 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A gas inlet assembly of a process chamber in a semiconductor process apparatus, configured to transport a process gas to a gas inlet pipeline communicating with the process chamber, comprising:
a plurality of mixing chambers arranged sequentially along a gas inlet direction, any two neighboring mixing chambers communicating with each other;
a gas inlet connector communicating with a most upstream mixing chamber in the gas inlet direction;
wherein:
a most downstream mixing chamber in the gas inlet direction communicates with the gas inlet pipeline;
a gas outlet direction of the gas inlet assembly is same as the gas inlet direction;
the gas inlet pipeline is downstream of the plurality of mixing chambers in the gas inlet direction;
the gas inlet pipeline includes a gradually expanding pipe segment and a straight pipe segment arranged sequentially along the gas inlet direction;
a cross-sectional size of the gradually expanding pipe segment gradually increases along the gas inlet direction;
a division plate is arranged in the gradually expanding pipe segment and the straight pipe segment of the gas inlet pipeline and configured to divide the gas inlet pipeline into a plurality of gas flow channels along a direction perpendicular to the gas inlet direction;
the division plate includes a uniform thickness portion and a gradually thinning portion arranged sequentially along the gas inlet direction; and
a thickness of the gradually thinning portion gradually decreases along the gas inlet direction.