US 12,404,240 B2
Photobase generator, compound, photoreactive composition, and reaction product
Koji Arimitsu, Tokyo (JP)
Assigned to Tokyo University of Science Foundation, Tokyo (JP)
Appl. No. 17/641,589
Filed by Tokyo University of Science Foundation, Tokyo (JP)
PCT Filed Sep. 10, 2020, PCT No. PCT/JP2020/034263
§ 371(c)(1), (2) Date Mar. 9, 2022,
PCT Pub. No. WO2021/049564, PCT Pub. Date Mar. 18, 2021.
Claims priority of application No. 2019-164869 (JP), filed on Sep. 10, 2019.
Prior Publication US 2022/0340528 A1, Oct. 27, 2022
Int. Cl. C07D 211/94 (2006.01)
CPC C07D 211/94 (2013.01) 6 Claims
 
1. A photobase generator, comprising a compound including:
first skeletons represented by the following formula (a); and
a second skeleton including nitrogen atoms bonding to bonding positions of the first skeletons to form amide groups,
wherein, in a molecule, a number of the first skeletons is two or more, a number of the nitrogen atoms, configuring the amide groups, in the second skeleton is the same as the number of the first skeletons, and at least one of the nitrogen atoms configuring the amide groups is converted into a nitrogen atom configuring a secondary amine or a tertiary amine by light irradiation:

OG Complex Work Unit Chemistry
wherein, in formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.