US 12,404,182 B2
Method for producing halide
Takashi Kubo, Hyogo (JP); Kazufumi Miyatake, Osaka (JP); Keita Mizuno, Aichi (JP); Tetsuya Asano, Nara (JP); and Akihiro Sakai, Nara (JP)
Assigned to PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD., Osaka (JP)
Filed by Panasonic Intellectual Property Management Co., Ltd., Osaka (JP)
Filed on Sep. 17, 2022, as Appl. No. 17/933,098.
Application 17/933,098 is a continuation of application No. PCT/JP2021/003305, filed on Jan. 29, 2021.
Claims priority of application No. 2020-064815 (JP), filed on Mar. 31, 2020.
Prior Publication US 2023/0015865 A1, Jan. 19, 2023
Int. Cl. C01F 17/253 (2020.01)
CPC C01F 17/253 (2020.01) 10 Claims
OG exemplary drawing
 
1. A production method for producing a halide, the method comprising heat-treating a mixed material containing (NH4)aYα3+a, (NH4)bSmβ3+b, Liγ, and Caδ2 in an inert gas atmosphere,
wherein α, β, γ, and δ are each independently at least one selected from the group consisting of F, Cl, Br, and I, and
the following three formulas:
0≤a≤3,
0≤b≤3, and
0<a+b≤6,
are satisfied.