US 12,403,709 B2
Scratch-off structure production
Yavin Atzmon, Ness Ziona (IL); and Inna Tzomik, Ness Ziona (IL)
Assigned to HP INDIGO B.V., Amstelveen (NL)
Filed by HP INDIGO B.V., Amstelveen (NL)
Filed on Dec. 15, 2023, as Appl. No. 18/541,767.
Application 17/153,113 is a division of application No. 16/606,218, granted, now 10,906,340, previously published as PCT/EP2017/074333, filed on Sep. 26, 2017.
Application 18/541,767 is a continuation of application No. 17/153,113, filed on Jan. 20, 2021, granted, now 11,878,541.
Prior Publication US 2024/0116303 A1, Apr. 11, 2024
Int. Cl. B41M 3/00 (2006.01); A63F 3/06 (2006.01); B42D 15/02 (2006.01)
CPC B41M 3/005 (2013.01) [A63F 3/0665 (2013.01); B42D 15/025 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A method of producing a structure including a scratch-off layer, comprising:
(a) applying a security ink layer on a first side of a substantially transparent substrate;
(b) forming an opaque background layer on the security ink layer; and
(c) applying an opaque cover layer on a second side of the substantially transparent substrate at a location aligned with the security ink layer, wherein the security ink layer includes security information which is visible through the substantially transparent substrate when the opaque cover layer is scratched off and wherein (a)-(c) are performed using a single printer, wherein the single printer includes a duplexer which is to enable (a)-(c) to be automatically performed on the first and second sides of the substantially transparent substrate, and wherein:
(a) and (b) are to be controlled by a first engine of the single printer, and
(c) is to be controlled by a second engine of the single printer.