US 12,403,507 B2
Transfer apparatus, cleaning module, and substrate processing apparatus
Asagi Matsugu, Tokyo (JP); Akihiro Yazawa, Tokyo (JP); Manato Furusawa, Tokyo (JP); Hideharu Aoyama, Tokyo (JP); Ayumu Saito, Tokyo (JP); Yusuke Sasaya, Tokyo (JP); Kenichi Kobayashi, Tokyo (JP); Yasuyuki Miyasawa, Tokyo (JP); Tsuyoshi Soma, Tokyo (JP); and Keiichi Nojo, Tokyo (JP)
Assigned to EBARA CORPORATION, Tokyo (JP)
Appl. No. 18/036,342
Filed by EBARA CORPORATION, Tokyo (JP)
PCT Filed Oct. 25, 2021, PCT No. PCT/JP2021/039244
§ 371(c)(1), (2) Date Sep. 27, 2023,
PCT Pub. No. WO2022/102386, PCT Pub. Date May 19, 2022.
Claims priority of application No. 2020-187971 (JP), filed on Nov. 11, 2020; and application No. 2020-216935 (JP), filed on Dec. 25, 2020.
Prior Publication US 2024/0001407 A1, Jan. 4, 2024
Int. Cl. B08B 1/20 (2024.01); B08B 3/12 (2006.01); B24B 37/34 (2012.01)
CPC B08B 1/20 (2024.01) [B08B 3/12 (2013.01); B24B 37/34 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A cleaning module comprising:
a first transfer mechanism for transferring a substrate with a surface to be polished facing downward up to a substrate grip or release position on a downstream side along a transfer passage;
a cleaning tank disposed at a position spaced apart from the transfer passage, the cleaning tank being for cleaning the substrate with the surface to be polished facing downward;
a transfer machine for transferring the substrate between the substrate grip or release position of the transfer passage and the cleaning tank; and
a second transfer mechanism for transferring the substrate transferred to the substrate grip or release position from the cleaning tank by the transfer machine to further downstream along the transfer passage.