US D1,040,304 S
Deposition ring for physical vapor deposition chamber
David Gunther, San Jose, CA (US); Cheng-Hsiung Tsai, Cupertino, CA (US); and Kirankumar Neelasandra Savandaiah, Bangalore (IN)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed on Jun. 25, 2021, as Appl. No. 29/796,739.
Application 29/796,739 is a continuation of application No. 16/222,662, filed on Dec. 17, 2018, granted, now 11,961,723.
Term of patent 15 Years
LOC (14) Cl. 15 - 09
U.S. Cl. D15—138  [D13/182]
OG exemplary drawing
 
The ornamental design for a deposition ring for a physical vapor deposition chamber, as shown and described.