US 12,075,687 B2
Mask and mask assembly
Sangshin Lee, Yongin-si (KR); Sanghoon Kim, Hwaseong-si (KR); Seil Kim, Hwaseong-si (KR); Hong-Kyun Ahn, Hwaseong-si (KR); Jongsung Park, Hwaseong-si (KR); and Seungjin Lee, Suwon-si (KR)
Assigned to Samsung Display Co., Ltd., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-si (KR)
Filed on Aug. 30, 2021, as Appl. No. 17/446,437.
Claims priority of application No. 10-2020-0182580 (KR), filed on Dec. 23, 2020.
Prior Publication US 2022/0199905 A1, Jun. 23, 2022
Int. Cl. H10K 71/16 (2023.01); C23C 14/04 (2006.01); H10K 59/12 (2023.01); H10K 71/00 (2023.01); H10K 71/10 (2023.01)
CPC H10K 71/166 (2023.02) [C23C 14/042 (2013.01); H10K 59/12 (2023.02); H10K 71/00 (2023.02); H10K 71/164 (2023.02); H10K 71/191 (2023.02)] 15 Claims
OG exemplary drawing
 
1. A mask comprising:
a body portion comprising a cell area, and a peripheral area surrounding the cell area, the body portion having a plurality of cell openings defined therein; and
a plurality of mark patterns at the peripheral area,
wherein the cell area comprises:
a first area; and
a second area adjacent to the first area,
wherein the plurality of cell openings comprises:
first cell openings defined at the first area, and spaced from each other; and
second cell openings defined at the second area, and spaced from each other,
and wherein a shape of the second cell openings is different from a shape of the first cell openings, and
wherein each of the mark patterns comprises at least one recess portion, and has a point-symmetrical shape with respect to a corresponding symmetry point.
 
10. A mask assembly comprising:
a plurality of masks located along one direction; and
a frame underneath the plurality of masks,
wherein each of the masks comprises a body portion comprising a cell area, and a peripheral area surrounding the cell area, the body portion having a plurality of cell openings defined therein,
wherein at least one of the masks comprise:
a plurality of mark patterns at the peripheral area, and comprising at least one recess portion; and
a hole adjacent to a first mark pattern from among the mark patterns, and wherein each of the mark patterns has a point-symmetrical shape with respect to a corresponding symmetry point, and
wherein the symmetry point overlaps the hole.