US 12,074,198 B2
Semiconductor device with improved temperature uniformity
Amaury Gendron-Hansen, Bend, OR (US); Dumitru Gheorge Sdrulla, Bend, OR (US); and Leslie Louis Szepesi, Bend, OR (US)
Assigned to Analog Power Conversion LLC, Bend, OR (US)
Filed by Analog Power Conversion LLC, Bend, OR (US)
Filed on Nov. 2, 2021, as Appl. No. 17/453,300.
Prior Publication US 2023/0139205 A1, May 4, 2023
Int. Cl. H01L 29/06 (2006.01); G06F 30/39 (2020.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); G06F 119/08 (2020.01); H01L 29/16 (2006.01)
CPC H01L 29/0696 (2013.01) [G06F 30/39 (2020.01); H01L 29/0856 (2013.01); H01L 29/1045 (2013.01); H01L 29/105 (2013.01); H01L 29/42368 (2013.01); H01L 29/42376 (2013.01); H01L 29/4238 (2013.01); H01L 29/66068 (2013.01); H01L 29/7802 (2013.01); G06F 2119/08 (2020.01); H01L 29/1608 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A semiconductor device comprising:
a first tub corresponding to a first region of a semiconductor die and including:
a first zone corresponding to a first projected operating temperature, and
a second zone corresponding to a second projected operating temperature greater than the first projected operating temperature,
wherein a first design parameter has a first value in the first zone and a second value different from the first value in the second zone,
wherein the first value being different from the second value configures the first tub to have a lower value for a first target operating parameter during operation of the semiconductor device than a value the first target operating parameter would have in a tub having a base tub design wherein the first value was equal to the second value, and
wherein the first target operating parameter is a maximum operating temperature in the second zone, a difference between a maximum operating temperature in the second zone and a maximum operating temperature in the first zone, a difference between a maximum operating temperature in the first tub and a minimum operating temperature in the first tub, or a combination thereof.