CPC H01L 21/67051 (2013.01) [B05B 11/02 (2013.01); B05C 5/02 (2013.01); B05C 11/10 (2013.01); F16K 1/32 (2013.01); F16K 1/36 (2013.01); F16K 31/1221 (2013.01); H01L 21/02057 (2013.01); H01L 21/02101 (2013.01); H01L 21/67017 (2013.01); H01L 21/6708 (2013.01)] | 20 Claims |
1. A liquid treating apparatus comprising:
a spin chuck configured to support and rotate a substrate; and
a liquid supply unit configured to supply a liquid to the substrate, and
wherein the liquid supply unit comprises:
a nozzle configured to discharge the liquid to the substrate;
a flow path pipe configured to connect the nozzle and the liquid supply source;
a valve assembly provided at the flow path pipe and configured to cut-off and suck-back a flow of the liquid within the flow path pipe
wherein the valve assembly comprising:
a cut-off valve configured to open and close a flow of a treating liquid within the flow path pipe; and
a suck-back valve provided adjacent to an end of the cut-off valve and configured to suck-back the liquid of the nozzle,
wherein the liquid treating apparatus further comprising: a first flow velocity controller configured to adjust a flow velocity of an air introduced into or outflowed from the cut-off valve; and
a second flow velocity controller configured to adjust a flow velocity of an air introduced into or outflowed from the suck-back valve, and
wherein the second flow velocity controller controls a suck-back moving speed of the liquid to be 10 mm/s or lower.
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