CPC G03F 7/70725 (2013.01) [G03F 7/70641 (2013.01); G03F 7/70775 (2013.01)] | 14 Claims |
1. An exposure apparatus for exposing a substrate via an original, comprising:
a substrate stage configured to hold the substrate;
an obtainment unit configured to obtain a first surface position in a height direction at a first measurement range in a first exposure region to be exposed on the substrate and a second surface position in the height direction at a second measurement range in a second exposure region, different from the first exposure region, to be exposed on the substrate, where the second measurement range is narrower than the first measurement range; and
a control unit configured to control driving of the substrate stage in the height direction when exposing the first exposure region based on the first surface position and control driving of the substrate stage in the height direction when exposing the second exposure region based on the second surface position,
wherein the control unit
obtains a first approximate surface approximately representing a cross-sectional shape of a surface of the first exposure region from the first surface position and a second approximate surface approximately representing a cross-sectional shape of a surface of the second exposure region from the second surface position, and
for the first exposure region, when information related to the first approximate surface does not exceed a first range, controls the driving based on a correction value related to the driving obtained from an approximate surface approximately representing a cross-sectional shape of a surface of an exposure region that has been exposed prior to the first exposure region, and for the second exposure region, when information related to the second approximate surface does not exceed a second range, controls the driving based on a correction value related to the driving obtained from an approximate surface approximately representing a cross-sectional shape of a surface of an exposure region that has been exposed prior to the second exposure region, where the second range is larger than the first range.
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