US 12,072,635 B2
Lithographic apparatus and a method of operating the apparatus
Christian Gerardus Norbertus Hendricus Marie Cloin, Gennep (NL); Nicolaas Ten Kate, Almkerk (NL); Nicolaas Rudolf Kemper, Eindhoven (NL); Marco Koert Stavenga, Eindhoven (NL); Erik Henricus Egidius Catharina Eummelen, Eindhoven (NL); Michel Riepen, Veldhoven (NL); Olga Vladimirovna Elisseeva, Waalre (NL); Tijmen Wilfred Mathijs Gunther, Utrecht (NL); and Michael Christiaan Van Der Wekken, Eindhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Nov. 22, 2021, as Appl. No. 17/531,953.
Application 17/531,953 is a continuation of application No. 14/858,885, filed on Sep. 18, 2015, granted, now 11,187,991.
Application 14/858,885 is a continuation of application No. 12/472,099, filed on May 26, 2009, granted, now 9,176,393.
Claims priority of provisional application 61/136,030, filed on Aug. 7, 2008.
Claims priority of provisional application 61/071,965, filed on May 28, 2008.
Prior Publication US 2022/0082948 A1, Mar. 17, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70341 (2013.01) [G03F 7/707 (2013.01); G03F 7/70716 (2013.01); G03F 7/70733 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A table apparatus for an immersion lithographic tool configured to supply and confine liquid between the table apparatus and a projection system configured to direct a beam of radiation at a substrate, the table apparatus comprising:
a support structure configured to support an object;
a shutter member having a top surface, wherein, in use, the top surface is substantially co-planar with a surface of the support structure; and
a fluid extraction system configured to extract liquid entering a gap between part of the table apparatus and part of another table, wherein the table apparatus is moveable relative to the another table or vice versa,
wherein the fluid extraction system comprises a plurality of extraction openings in or below the gap and in a sidewall surface of the shutter member or of the support structure, each extraction opening being an aperture of an extraction channel and each extraction channel is connected to a collector channel, the collector channel being common to at least two extraction channels, and the sidewall surface is at an oblique angle to the top surface such that the oblique angle sidewall surface has the extraction openings therein.