CPC G03F 7/11 (2013.01) [C08G 8/26 (2013.01); C08G 10/00 (2013.01); C09D 161/12 (2013.01); C09D 161/18 (2013.01); H01L 21/0274 (2013.01); H01L 21/31144 (2013.01)] | 13 Claims |
1. A resist underlayer film-forming composition comprising a solvent and a reaction product between a C6-C60 aromatic compound and a carbonyl group of a C3-C60 cyclic carbonyl compound,
the cyclic carbonyl compound containing not less than 5% by mass of heteroatom,
the reaction product being such that one carbon atom in the cyclic carbonyl compound connects two molecules of the aromatic compound,
wherein the cyclic carbonyl compound is represented by the following formula (1):
![]() where:
X is O, NH or CH2, and
the ring Y is a 3- to 8-membered ring optionally interrupted with a heteroatom and optionally substituted with a C1-C20 alkyl group optionally substituted with a hydroxyl group, a carbonyl group and optionally interrupted with an oxygen atom or a sulfur atom, a hydroxyl group, an oxo group, a carboxyl group, a cyano group, a nitro group, a sulfo group, a C1-C6 acyl group, a C1-C6 alkoxy group, a C1-C6 alkoxycarbonyl group, an amino group, a glycidyl group, a C6-C20 aryl group, a C2-C10 alkenyl group, or a C2-C10 alkynyl group, or is a coupled ring or condensed ring of such 3- to 8-membered rings.
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