US 12,072,629 B2
Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added
Takafumi Endo, Toyama (JP); Keisuke Hashimoto, Toyama (JP); Hirokazu Nishimaki, Toyama (JP); and Rikimaru Sakamoto, Toyama (JP)
Assigned to NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo (JP)
Appl. No. 15/127,889
Filed by NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo (JP)
PCT Filed Mar. 17, 2015, PCT No. PCT/JP2015/057900
§ 371(c)(1), (2) Date Sep. 21, 2016,
PCT Pub. No. WO2015/151803, PCT Pub. Date Oct. 8, 2015.
Claims priority of application No. 2014-072734 (JP), filed on Mar. 31, 2014.
Prior Publication US 2017/0097568 A1, Apr. 6, 2017
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/11 (2006.01); C08G 14/02 (2006.01); C09D 161/34 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/34 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01)
CPC G03F 7/11 (2013.01) [C08G 14/02 (2013.01); C09D 161/34 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); H01L 21/0276 (2013.01); H01L 21/0337 (2013.01); H01L 21/0332 (2013.01)] 12 Claims
 
1. A resist underlayer film-forming composition comprising
a novolac resin, and
a solvent selected from the group consisting of propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and mixtures thereof,
wherein the novolac resin has a structure group (C) as an additional group that is obtained by addition reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B) having one vinyl group in the molecule in the presence of an aldehyde,
wherein the aromatic ring-containing compound (A) and the aromatic vinyl compound (B) are reacted at a molar ratio (A):(B) of 1:0.1 to 8.0,
wherein the aromatic ring-containing compound (A) is an aromatic amine compound selected from the group consisting of phenylindole and phenylnaphthylamine,
wherein the structure group (C) is represented by Formula (2):

OG Complex Work Unit Chemistry
wherein in Formula (2), Ar1, R1 and R2 are each a group derived from the aromatic vinyl compound (B), wherein Ar1 is a phenyl group, R1 is a hydroxyl group, R2 is a hydrogen atom, a methyl group, or a phenyl group, and m is 1 Ar1 is a phenyl group, R1 is a hydroxyl group, R2 is a hydrogen atom, a methyl group, or a phenyl group, and m is 1, and A1 is a group derived from the aromatic ring structure of the aromatic ring-containing compound (A), and
wherein the aldehyde is naphthaldehyde or pyrenecarboxyaldehyde.