US 12,072,628 B2
Resist composition and pattern forming process
Jun Hatakeyama, Joetsu (JP); and Tomomi Watanabe, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Mar. 10, 2021, as Appl. No. 17/197,466.
Claims priority of application No. 2020-047897 (JP), filed on Mar. 18, 2020.
Prior Publication US 2021/0302838 A1, Sep. 30, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/0392 (2013.01) [G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/2004 (2013.01)] 14 Claims
 
1. A resist composition comprising a base polymer and a quencher containing a salt compound having the formula (A):

OG Complex Work Unit Chemistry
wherein m1 is an integer of 1 or 2, m2 is an integer of 1 to 3, n is an integer of 1 to 3, j is an integer of 1 to 3, k is an integer of 1 or 2,
XBI is iodine or bromine,
Rah is a C1-C20 (j+1)-valent aliphatic hydrocarbon group which may contain at least one selected from an ether bond, a carbonyl moiety, an ester bond, an amide bond, a sultone ring, a lactam ring, a carbonate moiety, a halogen other than iodine, a C6-C12 aryl moiety, a hydroxyl moiety, or a carboxyl moiety,
X1 is a single bond, an ether bond, an ester bond, an amide bond, a carbonyl group, or a carbonate group,
R1 is a single bond or a C1-C20 (m1+1)-valent hydrocarbon group which may contain an ether bond, an ester bond, or a hydroxyl moiety,
R2 is a single bond or a C1-C20 (m2+1)-valent hydrocarbon group which may contain at least one selected from an ether bond, a carbonyl moiety, an ester bond, an amide bond, a sultone ring, a lactam ring, a carbonate moiety, a halogen other than iodine, a hydroxyl moiety, or a carboxyl moiety,
R3 is hydrogen, a nitro group, a C1-C20 hydrocarbyl group, or a C2-C20 hydrocarbyloxycarbonyl group, the C1-C20 hydrocarbyl group or a hydrocarbyl moiety in the C2-C20 hydrocarbyloxycarbonyl group may contain at least one selected from a hydroxyl moiety, a carboxyl moiety, a thiol moiety, an ether bond, an ester bond, a sulfonyl moiety, a nitro moiety, a cyano moiety, a halogen, or an amino moiety, two R3s in a case where n is 1, or R3 and R1 may bond together to form a ring with a nitrogen atom to which two R3s or R3 and R1 are attached, the ring which may contain a double bond, oxygen, sulfur, or nitrogen, and
Ak− is a carboxylic acid anion, a sulfonimide anion free of fluorine, or a sulfonamide anion.