US 12,072,625 B2
Nozzle unit, liquid treatment apparatus, and liquid treatment method
Takuya Miura, Koshi (JP); Kouichirou Tanaka, Koshi (JP); Shogo Takahashi, Koshi (JP); Yusuke Miyakubo, Koshi (JP); and Kentaro Yoshihara, Koshi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Apr. 23, 2021, as Appl. No. 17/238,541.
Claims priority of application No. 2020-079398 (JP), filed on Apr. 28, 2020; and application No. 2020-167147 (JP), filed on Oct. 1, 2020.
Prior Publication US 2021/0333707 A1, Oct. 28, 2021
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/0025 (2013.01) 9 Claims
OG exemplary drawing
 
1. A nozzle unit for a liquid treatment apparatus that performs a liquid treatment on a substrate using a liquid, the nozzle unit comprising:
a first gas nozzle having a discharge flow path for allowing a first gas to flow through the discharge flow path and a first discharge port for discharging the first gas flowing through the discharge flow path toward a surface of the substrate;
a second gas nozzle having a second discharge port for discharging a second gas toward the surface; and
a drive part configured to move the first gas nozzle and the second gas nozzle together along the surface,
wherein the first discharge port is formed so as to extend in a first direction along the surface, and
wherein an inner width of the discharge flow path in the first direction increases as the discharge flow path approaches the first discharge port, so that the first gas is discharged radially from the first discharge port.