US 12,071,688 B2
Precursors and methods for preparing silicon-containing films
SangJin Lee, Suwon (KR); DaHye Kim, Suwon (KR); Sungsil Cho, Anyang (KR); Seobong Chang, Suwon (KR); Jae Eon Park, HwaSung (KR); Bryan C. Hendrix, Danbury, CT (US); Thomas H. Baum, New Fairfield, CT (US); and SooJin Lee, Suwon (KR)
Assigned to ENTEGRIS, INC., Billerica, MA (US)
Filed by ENTEGRIS, INC., Billerica, MA (US)
Filed on Mar. 26, 2021, as Appl. No. 17/214,701.
Claims priority of provisional application 63/002,855, filed on Mar. 31, 2020.
Prior Publication US 2021/0301400 A1, Sep. 30, 2021
Int. Cl. C23C 16/455 (2006.01); C07F 7/02 (2006.01); C07F 7/10 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/50 (2006.01); H01L 21/02 (2006.01)
CPC C23C 16/45553 (2013.01) [C07F 7/025 (2013.01); C07F 7/10 (2013.01); C23C 16/345 (2013.01); C23C 16/402 (2013.01); C23C 16/45536 (2013.01); C23C 16/50 (2013.01); H01L 21/02219 (2013.01); H01L 21/02274 (2013.01); H01L 21/0228 (2013.01); H01L 21/02164 (2013.01); H01L 21/0217 (2013.01)] 15 Claims
 
1. A compound of Formula (I):

OG Complex Work Unit Chemistry
wherein each R1 is independently selected from a group consisting of hydrogen, C1-C4 alkyl, or a halogen atom selected from a group consisting of Cl, Br, and I, and wherein at least one R1 is other than hydrogen.