US 12,071,686 B2
Liner assemblies for substrate processing systems
Arash Abedijaberi, Corning, NY (US); and Shawn George Thomas, Chesterfield, MO (US)
Assigned to GlobalWafers Co., Ltd., Hsinchu (TW)
Filed by GlobalWafers Co., Ltd., Hsinchu (TW)
Filed on Apr. 27, 2023, as Appl. No. 18/307,988.
Application 18/307,988 is a division of application No. 17/162,729, filed on Jan. 29, 2021, granted, now 11,668,006.
Application 16/235,671 is a division of application No. 14/176,263, filed on Feb. 10, 2014, granted, now 10,344,380, issued on Jul. 9, 2019.
Application 17/162,729 is a continuation of application No. 16/235,671, filed on Dec. 28, 2018, granted, now 10,907,251, issued on Feb. 2, 2021.
Claims priority of provisional application 61/763,280, filed on Feb. 11, 2013.
Prior Publication US 2023/0257879 A1, Aug. 17, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/00 (2006.01); C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/00 (2006.01)
CPC C23C 16/45504 (2013.01) [C23C 16/45563 (2013.01); H01J 37/3244 (2013.01); H01J 37/32477 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A chemical vapor deposition system for processing a substrate, the system comprising:
a processing chamber having a processing volume enclosed therein, the processing chamber including a lower chamber wall and an upper chamber wall;
a first liner disposed between the lower chamber wall and the processing volume, the first liner including a first fluid guide including a first portion and a second portion, the first portion has a first portion radius, the second portion has a second portion radius; and
a second liner disposed between the upper chamber wall and the processing volume, the second liner including a second fluid guide including a third portion and a fourth portion, the third portion has a third portion radius, the fourth portion has a fourth portion radius, wherein the third portion is opposite the first portion and the fourth portion is opposite the second portion such that a rounded fluid guiding channel is defined between the first fluid guide and the second fluid guide, wherein the first fluid guide and the second fluid guide are continuously rounded surfaces.