US 12,070,900 B2
Photon propagation modified additive manufacturing compositions and methods of additive manufacturing using same
John R. Salasin, Lynchburg, VA (US); and Benjamin D. Fisher, Lynchburg, VA (US)
Assigned to BWXT Advanced Technologies LLC, Lynchburg, VA (US)
Filed by BWXT Advanced Technologies LLC, Lynchburg, VA (US)
Filed on Jul. 3, 2023, as Appl. No. 18/217,667.
Application 18/217,667 is a division of application No. 17/515,625, filed on Nov. 1, 2021, granted, now 11,731,350.
Claims priority of provisional application 63/109,882, filed on Nov. 5, 2020.
Prior Publication US 2023/0339175 A1, Oct. 26, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. B29C 64/00 (2017.01); B29C 64/165 (2017.01); B33Y 10/00 (2015.01); B33Y 70/10 (2020.01); B33Y 80/00 (2015.01); C08F 2/08 (2006.01); C08F 2/46 (2006.01); C08F 22/10 (2006.01); C08K 3/08 (2006.01); C08K 3/22 (2006.01); G21C 3/50 (2006.01)
CPC B29C 64/165 (2017.08) [B33Y 10/00 (2014.12); B33Y 70/10 (2020.01); B33Y 80/00 (2014.12); C08F 2/08 (2013.01); C08F 2/46 (2013.01); C08F 22/1006 (2020.02); C08K 3/08 (2013.01); C08K 3/22 (2013.01); G21C 3/50 (2013.01); C08K 2003/0856 (2013.01); C08K 2201/003 (2013.01)] 25 Claims
OG exemplary drawing
 
1. A slurry for additive manufacturing having a composition comprising (in vol. % relative to total volume of the slurry):
 
a plurality of first particles 30 vol. % to 40 vol. %;
a plurality of second particles 10 vol. % to 20 vol. %;
a dispersant >0 vol. % to 5 vol. %;
a photoabsorber greater than 0 vol. %;
a photoinitiator greater than 0 vol. %; and
at least one monomer resin 25 vol. % to <45 vol. % as a balance,
 
wherein a total amount of plurality of first particles and plurality of second particles is maximum 60 vol. %,
wherein the first particles have a composition including a uranium-containing material,
wherein the second particles have an absorbance for wavelengths of 300 nm to 700 nm that is equal to or greater than 0 Au and is less 1.0 Au,
wherein the photoabsorber, and photoinitiator operate within an incident wavelength of 300 nm to 700 nm.