US 12,070,600 B2
Method for high frequency pulse application for cosmetic improvement effect of skin and skin care device using the same
Sun Young Kang, Seoul (KR)
Assigned to SHENB CO., LTD., Seoul (KR)
Filed by SHENB Co., Ltd., Seoul (KR)
Filed on Nov. 22, 2023, as Appl. No. 18/517,889.
Claims priority of application No. 10-2022-0159311 (KR), filed on Nov. 24, 2022.
Prior Publication US 2024/0173545 A1, May 30, 2024
Int. Cl. A61B 18/14 (2006.01); A61N 1/00 (2006.01); A61N 1/32 (2006.01)
CPC A61N 1/328 (2013.01) [A61N 1/325 (2013.01); A61N 1/327 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A skin care method based on high-frequency pulses application, comprising:
generating the high-frequency pulses and applying the high-frequency pulses to the skin,
wherein said generating and applying the high-frequency pulses includes outputting high frequency (RF) for a certain period of time to the skin,
wherein the high frequency (RF) output for the certain period of time has a selected number of pulses in the range of 2 to N (N is a natural number less than 11),
wherein each pulse has On time and Off time, the On time is a time period when pulse waveform is output, and the Off time is a time period when no pulse waveform is output,
wherein the On time and the Off time are alternately repeated based on the number of pulses during the certain period of time for outputting high frequency (RF), so that a desired high-frequency pulse is applied to the skin during the On time, and
wherein when the selected number of pulses is any one of 2 to N, the time period of the On time is determined by Equation 1 and the time period of the Off time is determined by Equation 2; whereby
On time=[TRF Time×{(10−Pulse+1)×10}÷100]÷Pulse  (Equation 1)
Off time=[TRF Time×{(Pulse−1)×10}÷100]÷Pulse,  (Equation 2)
wherein the TRF Time denotes the certain period of time for outputting high frequency (RF), and the Pulse denotes the selected number (natural number) of high frequency pulses.