US D997,111 S
Collimator for use in a physical vapor deposition (PVD) chamber
Martin Lee Riker, Milpitas, CA (US); Fuhong Zhang, San Jose, CA (US); Lanlan Zhong, Sunnyvale, CA (US); and Kishor Kumar Kalathiparambil, Santa Clara, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed on Apr. 4, 2022, as Appl. No. 29/833,398.
Claims priority of application No. 2021-027601 D (JP), filed on Dec. 15, 2021; and application No. 2021-027602 D (JP), filed on Dec. 15, 2021.
This patent is subject to a terminal disclaimer.
Term of patent 15 Years
LOC (14) Cl. 13 - 03
U.S. Cl. D13—182
OG exemplary drawing
 
We claim the ornamental design for a collimator for use in a physical vapor deposition (PVD) chamber, as shown and described.