US 11,742,221 B2
Dry cleaning apparatus and dry cleaning method
Seung-Min Shin, Daejeon (KR); Seok-Hoon Kim, Seongnam-si (KR); Young-Hoo Kim, Yongin-si (KR); In-Gi Kim, Hwaseong-si (KR); Tae-Hong Kim, Seoul (KR); Sung-Hyun Park, Daegu (KR); Jin-Woo Lee, Yongin-si (KR); Ji-Hoon Cha, Seoul (KR); and Yong-Jun Choi, Gwacheon-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Jul. 15, 2021, as Appl. No. 17/376,369.
Application 17/376,369 is a continuation of application No. 16/371,461, filed on Apr. 1, 2019, granted, now 11,087,996.
Claims priority of application No. 10-2018-0107944 (KR), filed on Sep. 10, 2018.
Prior Publication US 2021/0343552 A1, Nov. 4, 2021
Int. Cl. H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01J 37/32 (2006.01); G02B 27/09 (2006.01); B23K 26/352 (2014.01); B08B 7/00 (2006.01); H01L 29/66 (2006.01); H10B 41/27 (2023.01); H10B 43/27 (2023.01)
CPC H01L 21/67034 (2013.01) [B08B 7/0042 (2013.01); B23K 26/352 (2015.10); G02B 27/0955 (2013.01); H01J 37/3244 (2013.01); H01J 37/32568 (2013.01); H01L 21/02098 (2013.01); H01J 2237/335 (2013.01); H01L 29/66545 (2013.01); H01L 29/66795 (2013.01); H10B 41/27 (2023.02); H10B 43/27 (2023.02)] 7 Claims
OG exemplary drawing
 
1. A dry cleaning method, comprising:
loading a substrate into a chamber;
supplying a dry cleaning gas into the chamber through a shower head;
generating plasma from the dry cleaning gas;
forming a cleaning process by-product by reacting the plasma with an etch residue on the substrate; and
irradiating a laser light on a surface of the substrate to heat the substrate, thereby transitioning the cleaning process by-product to a gaseous cleaning process by-product.