US 11,742,185 B2
Uniform in situ cleaning and deposition
Saket Rathi, Santa Clara, CA (US); Tuan A. Nguyen, San Jose, CA (US); Amit Bansal, Milpitas, CA (US); Yuxing Zhang, San Jose, CA (US); Badri N. Ramamurthi, Los Gatos, CA (US); Nitin Pathak, Mumbai (IN); Abdul Aziz Khaja, San Jose, CA (US); and Sarah Michelle Bobek, Sunnyvale, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 26, 2021, as Appl. No. 17/213,947.
Prior Publication US 2022/0310360 A1, Sep. 29, 2022
Int. Cl. H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); C23C 16/44 (2006.01)
CPC H01J 37/32449 (2013.01) [C23C 16/4405 (2013.01); C23C 16/45502 (2013.01); C23C 16/45591 (2013.01); C23C 16/50 (2013.01); H01J 37/32357 (2013.01); H01J 37/32862 (2013.01); H01J 2237/332 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A semiconductor processing system, comprising:
an output manifold that defines a central aperture and at least one gas outlet disposed radially outward of the central aperture;
a gasbox disposed beneath the output manifold, the gasbox comprising an inlet side facing the output manifold and an outlet side opposite the inlet side, the gasbox comprising an inner wall that defines a central fluid lumen that is aligned and in fluid communication with the central aperture of the output manifold, wherein:
the inner wall tapers outward from the inlet side to the outlet side;
the at least one gas outlet is disposed radially outward of a top of the central fluid lumen;
the inlet side of the gasbox defines a recess that extends radially outward to at least the at least one gas outlet and provides a volume that fluidly couples the at least one gas outlet and the central fluid lumen; and
a bottom of the recess defines a ledge that extends to an outer edge of the top of the central fluid lumen;
an annular spacer disposed below the gasbox, wherein an inner diameter of the annular spacer is greater than a largest inner diameter of the central fluid lumen; and
a faceplate disposed beneath the annular spacer, the faceplate defining a plurality of apertures extending through a thickness of the faceplate.