CPC H01G 9/2022 (2013.01) [C03C 17/09 (2013.01); C23C 16/06 (2013.01); C23C 16/4486 (2013.01); H01G 9/0029 (2013.01); H01G 9/2036 (2013.01); H01G 9/2059 (2013.01); C03C 2217/254 (2013.01); C03C 2218/152 (2013.01)] | 20 Claims |
1. An aerosol assisted chemical vapor deposition method for depositing a platinum layer onto a substrate, the method comprising:
heating the substrate to a deposition temperature above 150° C. in a reactor; and
introducing into the reactor, at the deposition temperature, an aerosol comprising a platinum dithiocarbamate compound, salt, and/or solvate thereof, at a deposition temperature in a range of 350 to 600° C., to thereby deposit the platinum layer on the substrate,
wherein the platinum dithiocarbamate compound is of formula (Ib):
wherein R1 and R2 are independently hydrogen or C1 to C3 alkyl, and
wherein R3 to R7 are independently hydrogen, C0-3-alkyl-halide, C1-5-alkyl, C0-3alkyl-alcohol, C0-3-alkyl-thiol, C0-3-alkyl-amine, C0-3-alkyl-carboxylate, C0-3-alkyl-nitrile, C0-3-alkyl-thiocyanate, C0-3-alkyl-isocyanate, C0-3-alkyl-cyanate, C0-3-alkyl-O—C1-5alkyl, C0-3alkyl-CO2—C1-5-alkyl, C0-3-alkyl-O2C—C1-5alkyl, C0-3-alkyl-N—(C1-5-alkyl)2, C0-3-alkyl-C(O)N—(C1-5-alkyl)2, C0-3-alkyl-C(O)—C1-5-alkyl, or C0-3-alkyl-S—C1-5-alkyl
wherein the platinum layer formed has a thickness in a range of at least 350 nm after 30 minutes of deposition time, and
wherein the platinum layer comprises at least 90 wt. % of elemental Pt, based on total deposition layer weight.
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