US 11,740,566 B2
Lithography apparatus
Paulus Albertus Van Hal, Waalre (NL); Adrianus Hendrik Koevoets, Mierlo (NL); and Beatriz Seoane De La Cuesta, Eindhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/790,986
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Dec. 16, 2020, PCT No. PCT/EP2020/086442
§ 371(c)(1), (2) Date Jul. 6, 2022,
PCT Pub. No. WO2021/144108, PCT Pub. Date Jul. 22, 2021.
Claims priority of application No. 20151581 (EP), filed on Jan. 14, 2020.
Prior Publication US 2023/0068088 A1, Mar. 2, 2023
Int. Cl. G03F 7/20 (2006.01); H01L 21/687 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/7095 (2013.01) [G03F 7/707 (2013.01); G03F 7/70783 (2013.01); H01L 21/6875 (2013.01)] 20 Claims
OG exemplary drawing
 
18. A method of providing a friction-switch during loading of a substrate onto a substrate holder, the method comprising:
applying a first molecular species comprising at least one low-interaction region of a friction-switch coating to provide the friction-switch to a first portion of the backside surface of the substrate;
applying a second molecular species to a second portion of the backside surface of the substrate; and
loading the substrate onto the substrate holder,
wherein the second molecular species reacts during loading of the substrate to form a high-interaction region of the friction-switch coating.