CPC G03F 7/70866 (2013.01) [G03F 7/70925 (2013.01)] | 20 Claims |
1. A lithography system comprising:
a first load lock chamber configured to receive a mask;
a cleaning module configured to clean the mask;
a second load lock chamber configured to receive a wafer; and
an exposure module configured to expose the wafer to a light source through use of the cleaned mask,
wherein a direct path is provided between the first load lock chamber and the exposure module allowing the first load lock chamber to directly couple to the exposure module without through the cleaning module.
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